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Derniers dépôts
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Glenn Otakandza Kandjani, Pascal Brault, Maxime Mikikian, Armelle Michau, Khaled Hassouni. Molecular dynamics simulation of the interaction of an Ar/CH4 plasma with a surface: Growth, structure, and sputtering of the deposited C:H films. Plasma Processes and Polymers, In press, ⟨10.1002/ppap.202400084⟩. ⟨hal-04609808⟩